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Enhanced Area-Selective Deposition via NH3 Plasma Treatment in Atomic Layer Deposition for Si/TiN Substrates

작성자 인하대 날짜 2026-07-30 10:50:28

Enhanced Area-Selective Deposition via NH3 Plasma Treatment in Atomic Layer Deposition for Si/TiN Substrates, 2025, American Chemical Society, http://doi.org/10.1021/acsami.5c16213

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