All-Sputter-Deposited Hf0.5Zr0.5O2 Double-Gate Ferroelectric Thin-Film Transistor With Amorphous Indium-Gallium-Zinc Oxide Channel
작성자 관리자
날짜 2023-11-24 14:56:49
All-Sputter-Deposited Hf0.5Zr0.5O2 Double-Gate Ferroelectric Thin-Film Transistor With Amorphous Indium-Gallium-Zinc Oxide Channel, IEEE ELECTRON DEVICE LETTERS, 2023, 10.1109/LED.2023.3260860
