Interfacial Reaction Engineering for Use in Hf0.5Zr0.5O2‑Based Metal-Ferroelectric-Metal Capacitors Using N2 + H2 Gas Pretreatment
작성자 인하대
날짜 2025-11-05 17:31:48
Interfacial Reaction Engineering for Use in Hf0.5Zr0.5O2‑Based Metal-Ferroelectric-Metal Capacitors Using N2 + H2 Gas Pretreatment, 2025, ACS Applied Electronic Materials, https://doi.org/10.1021/acsaelm.5c00045
